Super-Resolution Multi-Channel Laser Direct Writing Technology
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Minimum feature size: 400nm
● Maximum exposure field: 215 × 215mm 2
● Exposure speed: 80min@100 × 100mm 2
● Scanning positioning accuracy: 2.5nm ● Working mode: More than 8 laser parallel direct writing,
with each exposure dose independently controlled.
● Maximum exposure field: 215 × 215mm 2
● Exposure speed: 80min@100 × 100mm 2
● Scanning positioning accuracy: 2.5nm ● Working mode: More than 8 laser parallel direct writing,
with each exposure dose independently controlled.
